Rapidus Corporation, a top developer of advanced logic semiconductors, is teaming up with Siemens Digital Industries Software. This partnership seeks to accelerate the design and making of new 2nm semiconductors. This partnership will create a process design kit (PDK) with Siemens’ Calibre® platform. This platform is a standard solution. It aids in physical verification, improves manufacturing, and assesses reliability in the semiconductor lifecycle.
The collaboration supports Rapidus’ “Manufacturing for Design” (MFD) initiative, aimed at enhancing yield and minimizing turnaround time from the early manufacturing stages. In line with this, Rapidus and Siemens EDA will create a comprehensive reference flow that unifies design, verification, and manufacturing from front-end to back-end. This will facilitate a streamlined development environment for Rapidus’ Rapid and Unified Manufacturing Service (RUMS).
“Our work with Rapidus signifies the deep integration of Siemens’ EDA technology into a new manufacturing base,” said Mike Ellow, CEO of Siemens EDA, Siemens Digital Industries Software. “By developing a reference flow using tools such as Calibre and Solido, we aim to set a new benchmark in semiconductor manufacturing for reliability, speed, scalability, and safety.”
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Rapidus is pioneering a fully integrated foundry model that connects the entire semiconductor value chain—from design through manufacturing. By collaborating with EDA providers like Siemens, Rapidus is reinforcing secure design data management, enhancing traceability, and reducing the risk of information leakage—thereby strengthening overall supply chain reliability.
“Rapidus is committed to advancing the co-optimization of manufacturing and design,” said Dr. Atsuyoshi Koike, CEO of Rapidus. “Our partnership with Siemens is a key milestone in realizing our Design Manufacturing Co-Optimization (DMCO) vision. By achieving MFD for the 2nm gate-all-around process, Rapidus aims to significantly reduce time-to-tape-out and deliver next-generation semiconductors faster and more efficiently.”
